共搜索到21701条信息,每页显示10条信息,共2171页。用时:0小时0分0秒437毫秒
......
vapor deposition reactor. The substrate surfaces were chemically pretreated by the following two-step etching method: first using Murakami reagent for 1-3min, and second an HNO3:HCl=1:1 solution... emerge in various shapes. The indentation testing shows that the good adhesion between diamond film and the substrate after HF CVD deposition could be obtained. Key words:chemical pretreatment; cemented......
Nanocrystalline Diamond Films Deposited by Electron Assisted Hot Filament Chemical Vapor Deposition Wang Linjun1,Xia Yiben1,Tan Shouhong2,Wu Nanchun1 (1.School of Materials Science & Engineering... wafer surface with electron assisted hot filament chemical vapor deposition at 1 kPa gas pressure, the deposited films were characterized and observed by Raman spectrum, X-ray diffraction, atomic force......
method applied to microwave plasma enhanced chemical vapor deposition diamond films [J]. Journal of Crystal Growth, 2001, 233(4): 723-729. [21] MALLIKA K, KOMANDURI R. Low pressure microwave plasma... filament chemical vapor deposition (HFCVD) diamond films are significantly influenced by the deposition parameters, such as the substrate temperature, total pressure and carbon concentration......
was tightly deposited by hot-filament chemical vapor deposition (HF-CVD). The nucleation and growth of diamond were investigated with micro-Raman spectroscope and field emission scanning electron microscope... simulation was conducted to understand the thermal management properties of prepared diamond/Cu microchannel heat sink.Key words:chemical vapor deposition; microchannel; nanoseeding; Ti interlayer; Cu......
Effects of deposition parameters on microstructure and thermal conductivity of diamond films deposited by DC arc plasma jet chemical vapor deposition QU Quan-yan(瞿全炎)1, 2, QIU Wan-qi(邱万奇)1, ZENG... the effect of the CH4 concentration on the thermal conductivity(s) of diamond films produced by microwave chemical vapor deposition(MWCVD) and hot filament chemical vapor deposition (HFCVD), respectively......
mechanics. Key words: nano-crystalline diamond film; optical absorption; chemical vapor deposition 1 Introduction Nano-crystalline diamond (NCD) films are being increasingly investigated due...-crystalline diamond thin films deposited on Si substrates in a hot filament chemical vapor deposition (HFCVD) system by optimizing deposition parameter. The grain size and surface roughness of the film......
in microwave plasma enhanced chemical vapor deposition (MPCVD) reactor with different deposition parameters. Adherent nanocrystalline diamond films were directly deposited on this steel substrate...Plasma enhanced diamond deposition on steel and Si substrates Y.S. Li1,Q. Yang2,A. Hirose1,Y. Tang1,C. Xiao1,W. Chen1 (1.Plasma Physics Laboratory, University of Saskatchewan, Saskatoon, SK S7N 5E2......
and the low residual stress in the film. Key words: diamond film; composites layer; electroplating; adhesion; chemical vapor deposition 1 Introduction Thermal consideration in the electronic package..., it is evident that the diamond wafer synthesized by chemical vapor deposition (CVD) itself is not good enough to dissipate heat, as its heat capacity is relatively low [3]. Furthermore, the high cost and low......
]. Diamond and Related Materials, 1998, 7: 1039-1042. [6] ZHANG X X, SHI T S, WANG J X, ZHANG X K. Oriented growth of a diamond film on Si(100) by hot filament chemical vapor deposition[J]. Journal of Crystal... it is helpful to the films’ quality, a series of experiments were done. The results show that the new method can enhance the orientation of the chemical vapor deposition diamond films, reduce......